Patents for C09K 3 - Materials not provided for elsewhere (52,772)
09/2002
09/17/2002US6451468 Liquid resin composition a) addition-polymerizable oligomer which is linear polyisobutylene or perfluoropolyether with alkenyl group at ends, b) hardener hydrogen atoms each bonded to silicon atom, c) hydrosilylation catalyst
09/17/2002US6451440 Moisture-curable polysiloxane component comprising a mixture or reaction product of a hydrolyzable polysiloxane polymer and a polyfunctional silicon compound; cyclic paraffinic hydrocarbon fluid
09/17/2002US6451432 Hydrophobic treatment composition, method for forming a coating and products provided with said coating
09/17/2002US6451411 Weatherseal having a substrate with an adhesive overflow containment groove
09/17/2002US6451351 Method for preparing gel with calcium salts of organic acids
09/17/2002US6451077 Fused abrasive particles, abrasive articles, and methods of making and using the same
09/17/2002US6451076 Resin overcoating on abrasive
09/17/2002CA2259281C Titanium dioxide particles, method for their preparation and their use in cosmetics, varnish and surface coating
09/17/2002CA2230182C Sealing material made of expanded graphite and a method of producing the same
09/17/2002CA2073074C Method for removing hydrocarbon products from the surface of an aqueous medium
09/17/2002CA2071952C An article having a high friction surface, an apparatus and a method for producing said article
09/17/2002CA2046992C Water-thickening copolymers and the use thereof
09/12/2002WO2002070618A2 Use of a silicone surfactant in polishing compositions
09/12/2002WO2002070597A1 Anti-clouding agent composition
09/12/2002WO2002003927A3 Deodorizing preparations containing dialkyl carbonates and propellants and their use as aerosols
09/12/2002US20020128336 Surface groups preferably are silane, organic acid, or organic base
09/12/2002US20020128327 Polishing composition and magnetic recording disk substrate polished with the polishing composition
09/12/2002US20020127407 Photocurable form-in-place gasket for electronic applications
09/12/2002US20020127395 For producing filter for plasma display panel
09/12/2002US20020125461 Ammonium oxalate-containing polishing system and method
09/12/2002US20020125460 Compositions for chemical mechanical planarization of tungsten
09/12/2002US20020125459 Reducing snow/ice buildup of snow and ice with sugar-water mixture (monosaccharides); corrosion resistance
09/12/2002US20020124578 Apparatus methods and compositions for placing additive fluids into a refrigerant circuit
09/12/2002US20020124577 Apparatus and methods for placing an additive fluid into a refrigerant circuit
09/11/2002EP1239018A1 Water dispersion type water and oil repellent composition and object treated with the same
09/11/2002EP1238417A1 Semiconductor processing silica soot abrasive slurry method for integrated circuit microelectronics
09/11/2002EP1238038A1 Environmentally friendly de-icer and anti-icer compositions
09/11/2002EP1238037A1 De-icing composition and method
09/11/2002EP1238004A1 Stain resistant compositions
09/11/2002EP1237978A1 Highly durable oil/water repellents for textiles
09/11/2002EP1237971A1 Adhesion promoters for monomer-free reactive polyurethanes
09/11/2002EP1237632A1 Golf ball with water immersion indicator
09/11/2002EP1153084B1 Polyorganosiloxane rtv compositions
09/11/2002EP1007599B1 Abrasive articles comprising a blend of abrasive particles
09/11/2002EP0932540B1 Deicing device
09/11/2002CN1368998A Abrasive grain with improved projectability
09/11/2002CN1368936A Method for chemodynamic production of diamond-type carbon structure, diamond-type carbon structure and uses of diamond-type carbon structure
09/11/2002CN1368912A Abrasive tools for grinding electronic components
09/11/2002CN1368520A Silastic composition capable of solid at room temp.
09/11/2002CN1090552C Abrasive material for precision surface treatment and manufacturing method thereof
09/10/2002US6448428 Fluorine-containing organic silicon compound and method for its production
09/10/2002US6448366 Reaction product of ethylene or hexamethylene diamine with 12-hydroxystearic acid and one of pentanoic, hexanoic, heptanoic or octanoic acids
09/10/2002US6448338 Hot-setting wash-fast sealant for shell structures
09/10/2002US6448182 Stabilization of peroxygen-containing slurries used in a chemical mechanical planarization
09/10/2002US6447917 Reinforcing fibers, friction modifier including 2 to 5% zeolite, 0.8 to 2 wt % antimony oxide and 0.2 to 1 wt % fluorine based polymer
09/10/2002US6447759 Ultraviolet absorbent
09/10/2002US6447695 Aqueous dispersion composition for chemical mechanical polishing for use in manufacture of semiconductor devices
09/10/2002US6447694 Composition for chemical mechanical polishing
09/10/2002US6447693 Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces
09/10/2002US6447588 Water-and-oil repellant composition of aqueous dispersion type
09/10/2002US6447563 Chemical mechanical polishing slurry system having an activator solution
09/10/2002US6447562 Abrasive
09/10/2002US6447375 Chemical mechanical polishing; drying, solidifying, batch processing, packaging
09/10/2002US6447373 Chemical mechanical polishing slurries for metal
09/10/2002US6447372 Polishing agent for semiconductor substrates
09/10/2002US6447118 Crosslinked polymer with finely dispersed metal oxide particles; transparency, dimensional stability, ultraviolet radiation absorbancy; contact or intraocular lenses; artificial corneas
09/06/2002WO2002068772A1 Method for producing a floor covering
09/06/2002WO2002068561A2 Cubic liquid crystalline phase precursor
09/06/2002WO2002068558A1 Water-based water repellant for treatment of substrates
09/06/2002WO2002068557A1 Hot sealing compound for aluminum foils applied to polypropylene and polystyrene
09/06/2002WO2002068491A1 Isocyanate free foamable mixtures
09/06/2002WO2002068486A2 Copolymers with water-soluble blocks comprising a hydrophobic block and a hydrophilic block
09/06/2002WO2002068482A1 Novel polymer and liquid gasket for in-place forming
09/06/2002CA2437126A1 Novel polymer and liquid gasket for in-place forming
09/05/2002US20020123543 Removal of free aldehydes
09/05/2002US20020123438 Clear, thickened detergent; spreadability; do not cause significant irritation to the skin and eyes
09/05/2002US20020123224 Chemical mechanical polishing slurry
09/05/2002US20020122928 Co-dispensed compositions for gaskets and other objects
09/05/2002US20020122925 Information display protectors
09/05/2002US20020121227 Titanium dioxide powder which contains iron oxide
09/05/2002US20020121225 High levels of low viscosity propylene glycol alginate and a surfactant; does not retard the release of active ingredients from the coated substrate.
09/05/2002US20020121156 Silicon-aluminum mixed oxide powder containing 0.1 to 99.9 wt. % Al2O3 and Si-O- Al-bonds; used for the chemical- mechanical polishing of semiconductor substrates.
09/05/2002DE10147707A1 Hochwirksame Schleifmittelzusammensetzung und diese enthaltender hochwirksamer Schleifmittelgegenstand zum Schleifen eines Frontglasfeldes einer Kathodenstrahlröhre Highly effective abrasive composition and containing them highly effective abrasive article for grinding a front glass panel of a cathode ray tube
09/05/2002DE10101446A1 Hemp oil absorbent is formed by coarsely shredding woody part of stem, for spreading over oil film
09/04/2002EP1236781A1 Synthetic resin emulsion and sealer composition containing the same for recoating
09/04/2002EP1235883A1 Aqueous hydraulic medium
09/04/2002EP1235639A1 Compositions including ether-capped poly(oxyalkylated) alcohol wetting agents
09/04/2002EP1019458B1 Methods of using ice-controlling molecules
09/04/2002EP0981562B1 Fluorochemical composition comprising a polyurethane having a fluorochemical oligomer and a hydrophilic segment to impart stain release properties to a substrate
09/04/2002EP0966506B1 Explosive fragmentation process
09/04/2002EP0748229B1 Polychelants
09/04/2002CN1367811A Water leakage preventive agent and method of preventing water leakage
09/04/2002CN1367809A CMP composition containing silane modified abrasive particles
09/04/2002CN1367748A Novel robot platform for stripping and/or painting and resulting work stations
09/04/2002CN1367221A Heat insulating material and its preparation method
09/04/2002CN1367167A Method for preparing carotenoid emulsion
09/04/2002CN1090222C Sliding material for light metal materials
09/04/2002CN1090221C Pressure-sensitive adhesive polymers
09/04/2002CN1090201C Zeolite in packaging film
09/04/2002CN1090200C Circuit substrate, circuit-formed suspension substrate, and prodn. method thereof
09/03/2002US6444859 Fluoroether compositions and methods for inhibiting their degradation in the presence of a Lewis acid
09/03/2002US6444611 Sorbent composition and apparatus for removing oil or oily substances from water, and process of manufacturing said composition
09/03/2002US6444139 Chemical mechanical polishing
09/03/2002US6443812 Chemical mechanical polishing (cmp) with pad made of such as polyvinylpyrrolidone having affinity for surface groups on a semiconductor wafer; nonscratching, smoothness, noncoating
09/03/2002CA2247904C Zeolite in packaging film
09/02/2002CA2360190A1 Environmentally safe low corrosive de-icers and the manufacturing method thereof
08/2002
08/29/2002WO2002067309A1 Polishing compound and method for polishing substrate
08/29/2002WO2002066573A1 Seal material
08/29/2002WO2002066532A1 Isocyanate-free expandable mixtures exhibiting a fast hardening rate
08/29/2002WO2002066245A1 Flexible graphite sheet having increased isotropy