Patents for C09K 3 - Materials not provided for elsewhere (52,772) |
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06/14/2006 | CN1787966A Silica and silica-based slurry |
06/14/2006 | CN1787964A Metal delivery system for nanoparticle manufacture |
06/14/2006 | CN1787895A Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
06/14/2006 | CN1787744A Agent for providing substrates based on cellulose and/or starch with water-repellent and simultaneously antifungal, antibacterial, insect-repellent and antialgal properties |
06/14/2006 | CN1786100A Method of sticking polyethylene polyproylene fiber water proof coiled material |
06/14/2006 | CN1786098A Polyaniline corrosion proof sealant |
06/14/2006 | CN1259700C Method for flattening dielectric layer |
06/14/2006 | CN1259386C Method for making glass antifogging agent |
06/14/2006 | CN1259356C Liquid crystal epoxy resin with branched chain, its preparing method, composition and use |
06/14/2006 | CN1259243C Material for imparting thixotropy and pasty resin composition |
06/13/2006 | US7060781 2,6-dimethyphenol composition |
06/13/2006 | US7060760 Moisture-curing adhesives and sealants, thermoplastic and vulcanized elastomers, membranes, as curable polymer additives, substrates into which inorganic semiconductors can be embedded in particle form; solvent and water-free; no residual harmful isocyanate monomer, biocompatibility, RTV |
06/13/2006 | US7060754 Using a propylene copolymer as nucleation agent |
06/13/2006 | US7060750 Moisture-curable, polyether urethanes and their use in sealant, adhesive and coating compositions |
06/13/2006 | US7060661 Aqueous, acidic compositions thickened with an amidoamine oxide gelling agent |
06/13/2006 | US7060621 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
06/13/2006 | US7060414 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate; a photoacid generator, sensitive to far ultraviolet radiation; excellant resolution |
06/13/2006 | US7060412 During exposure to heat does not involve the ablation of exposed regions by vaporization and which after the stage of exposure to heat does not involve removal of the unexposed regions with a developer bath |
06/13/2006 | US7060129 Displacement of gelling additive to well bore; crosslinking; forming barrier |
06/13/2006 | US7059941 Using amine; polishing ratio of dielectric to stopper film; removing sedimentation from silicon |
06/13/2006 | CA2217326C Novel tire sealer and inflator compositions |
06/08/2006 | WO2006059670A1 Chitosan complex |
06/08/2006 | WO2006059537A1 Process for producing abrasive material, abrasive material produced by the same, and process for producing silicon wafer |
06/08/2006 | WO2006059474A1 Primer coating composition for elastomer and coated article |
06/08/2006 | WO2006059042A1 Substrate which is protected against organic pollution |
06/08/2006 | WO2005098200A3 Paraffin inhibitors |
06/08/2006 | US20060122352 Polyurethane prepolymer and a polyaldimine from a polyamine having aliphatic primary amino groups and an aldehyde; odorless before, during and after hardening |
06/08/2006 | US20060122341 for vinyl aromatic monomers |
06/08/2006 | US20060122287 Polyol composition of the two-part system for foam grindstone, two-part curable composition for foam grindstone, foam grindstone, and process for production thereof |
06/08/2006 | US20060121235 For use in a manual transmission of an automobile; friction material containing a phenol resin containing 40-70 wt. % of dispersed porous carbon powder is joined to an inner peripheral surface and an outer peripheral surface of the ring body |
06/08/2006 | US20060120930 Method for setting firing temperature of cerium carbonate, method for producing cerium oxide abrasives and cerium oxide abrasives obtained by the method |
06/08/2006 | US20060118524 Cerium oxide abrasive and method of polishing substrates |
06/08/2006 | US20060117997 mixture of tri-ethylamine, ammonium bifluoride and a wetting agent in water; for treating colored concrete, glazed enamel or porcelain surfaces to increase the coefficient of friction of the surface; non discoloring |
06/08/2006 | US20060117995 Aqueous preparation for coloring surfaces |
06/08/2006 | US20060117667 For chemical mechanical polishing (CMP) of semiconductors; fluid, a oxidizing agent and a free radical-inducing activator |
06/08/2006 | US20060117666 Polishing composition |
06/08/2006 | DE202005020568U1 Grinding agent for grinding a workpiece comprises grinding grains embedded in a matrix having a duroplastic binder and elastic enough to press the grinding grains engaging the contact surface into the matrix during grinding |
06/08/2006 | DE10251818B4 Lose, rieselfähige Gummipartikel, Verfahren zu deren Herstellung und deren Verwendung Loose, free-flowing rubber particles, processes for their preparation and their use |
06/08/2006 | DE10218771B4 Baugrubenumschließung und Verfahren zum Herstellen einer Baugrubenumschließung Retaining wall and method for manufacturing a retaining wall |
06/08/2006 | DE102004056849A1 Neue Polyisocyanatgemische, ein Verfahren zu ihrer Herstellung und ihre Verwendung als Härterkomponente in Polyurethanlacken New polyisocyanate, a process for their preparation and their use as a curing component in polyurethane lacquers |
06/08/2006 | CA2589494A1 Substrate which is protected against organic pollution |
06/07/2006 | EP1666558A1 Thixotropy imparting agent |
06/07/2006 | EP1666536A1 Curable composition |
06/07/2006 | EP1666534A1 Fibre reinforced silicone rubber shaped body, process for forming the same and its use as a membrane, sealing body, jacket, spring body and cover |
06/07/2006 | EP1666528A1 Rubber composition for top cover gaskets for hard disk drives |
06/07/2006 | EP1666524A1 Perfluoroelastomer sealing material |
06/07/2006 | EP1666431A2 Low dust wall repair compound |
06/07/2006 | EP1666029A1 Pressurised metered dose inhalers (MDI) |
06/07/2006 | EP1664365A1 Boron coated abrasives |
06/07/2006 | EP1664233A1 Tape joint compositions with carboxymethyl cellulose (cmc) thickener system |
06/07/2006 | EP1664230A2 Hydrophobic composites and particulates and applications thereof |
06/07/2006 | EP1663486A2 Low-odor catalyst for isocyanate-derived foams and elastomers |
06/07/2006 | EP1373163B1 Method for producing cubic boron nitride |
06/07/2006 | EP1232198B1 Uv-curable compositions |
06/07/2006 | CN1784719A Method of texture processing on glass substrate for magnetic hard disk and slurry therefor |
06/07/2006 | CN1784480A Surface-treating agent comprising fluoropolymer |
06/07/2006 | CN1783359A Screening material for medium voltage rubber insulation cable |
06/07/2006 | CN1782014A Polishing composition and polishing method using said composition |
06/07/2006 | CN1782013A Polishing composition for a semiconductor substrate |
06/07/2006 | CN1782012A Curing resin composition and sealants and end-sealing materials for displays |
06/07/2006 | CN1782005A Slurry,chemical mechanical polishing method and method of forming a surface of a capacitor using the slurry |
06/07/2006 | CN1781991A Crosslinkable silicone compositions having long pot life and storage stability |
06/07/2006 | CN1781975A Polyphenylene sulfide member and its manufacturing method |
06/07/2006 | CN1781971A Polishing composition |
06/07/2006 | CN1781914A Organic polymer and novel polymerizable compound |
06/06/2006 | US7057001 Polymers with urea groups and silyl groups and production and use thereof |
06/06/2006 | US7056986 Ethylene-acrylic copolymer rubber composition |
06/06/2006 | US7056869 Printing inks, metal working fluid, drilling fluid, solvents |
06/06/2006 | US7056845 Finishing of textile fibers, tissues and fabrics |
06/06/2006 | US7056829 Polishing composition for semiconductor wafers |
06/06/2006 | US7056454 baking a material having a rare earth element (e.g., bastnaesite, xenotime or monazite); pulverizing the baked material; pulverizing a polar material capable of spontaneous polarization; and mixing the two pulverized materials |
06/06/2006 | US7056450 neutralizing an aqueous solution of an N,N-dialkylglycine alkali metal salt with a mineral acid; condensing the obtained solution by removal of water; and solid-liquid separation the deposited alkali metal-mineral acid salt from the resulting slurry |
06/06/2006 | CA2399533C Polydimethylsiloxane and fluorosurfactant fusing release agent |
06/06/2006 | CA2260778C Scratch-resistant anti-fog coating composition incorporating isocyanate-reactive surfactants |
06/06/2006 | CA2249434C Process for forming polyalphaolefin drag reducing agents and composition containing same |
06/01/2006 | WO2006057479A1 Slurry for use in metal-chemical mechanical polishing and preparation method thereof |
06/01/2006 | WO2006057332A1 Thermoplastic polymer composition |
06/01/2006 | WO2006057142A1 Carbon fiber composite material, process for producing the same and wet friction member |
06/01/2006 | WO2005086720A3 Thermoplastic composition comprising a co2 releasing material |
06/01/2006 | US20060116295 Method of delaying the setting time of crosslinked lost circulation control pills |
06/01/2006 | US20060116054 Polishing body |
06/01/2006 | US20060115973 Metal polishing composition and method of polishing using the same |
06/01/2006 | US20060114406 Method of sealing two substrates with a non-epoxy or epoxy-acrylate sealant using laser radiation |
06/01/2006 | US20060113509 Hydrophobic-hydrophilic compounds for treating metallic surfaces |
06/01/2006 | US20060113283 Polishing composition for a semiconductor substrate |
06/01/2006 | US20060112849 Use of MoO3 as corrosion inhibitor, and coating composition containing such as inhibitor |
06/01/2006 | US20060112649 Hydrothermal synthesis of cerium-titanium oxide for use in CMP |
06/01/2006 | US20060112647 Polishing composition |
06/01/2006 | DE102004057382A1 Verfahren zur Herstellung dünner Schichten eines Silikons, dünnes Silikon und Verwendung A method for producing thin layers of a silicon thin silicone and using |
06/01/2006 | DE102004057294A1 Verwendung von Polymeren, welche mit Säuregruppen modifizierte Aminogruppen aufweisen, zur Herstellung von Feuchtmitteln oder Feuchtmittelkonzentraten sowie in Feuchtmittelumläufen für den Offsetdruck The use of polymers having modified amino groups with acid groups, for the preparation of fountain solutions or fountain solution concentrates and in Feuchtmittelumläufen for offset printing, |
06/01/2006 | DE102004054553A1 Moisture-sensitive electronic device element manufacture involves activating desiccant on internal surface of enclosure, upon exposure to microwave radiation of wavelength that is absorbed by water molecules |
05/31/2006 | EP1661961A2 Metal polishing composition and method of polishing using the same |
05/31/2006 | EP1661941A1 Expandable composition for filling use, expandable member for filling use and expanded article for filling use |
05/31/2006 | EP1661680A1 Moulds for the production of plastic abrasives and support thereof |
05/31/2006 | EP1660606A1 Abrasive particles for chemical mechanical polishing |
05/31/2006 | EP1660584A1 Silicone oil-in-water (o/w) emulsions or compositions useful for water repellent applications |
05/31/2006 | EP1342025B1 Form-in-place gasket for electronic applications |
05/31/2006 | EP1305320B1 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith |
05/31/2006 | EP1296802B1 Functionalized diamond, methods for producing same, abrasive composites and abrasive tools comprising functionalized diamonds |
05/31/2006 | EP1272540B1 Aqueous (meth)acrylate copolymer dispersions, method for producing the same, and the use thereof |