C09K 3 - Materials not provided for elsewhere

Patents for C09K 3 - Materials not provided for elsewhere (52,772)
12/2007
12/05/2007	CN100352874C Apparatus and method for replacing a media content item
12/05/2007	CN100352856C Fluorine-containing elastomer composition with excellent plasma-aging prevention effect and shaped article made thereof
12/05/2007	CN100352783C Insulating glass unit with structural primary sealant system
12/05/2007	CN100352606C Abrasive particles, abrasive articles, and methods of making and using the same
12/05/2007	CN100352516C Superabsorbing foam, method for the production thereof, and use thereof
12/04/2007	US7304098 Hydrogel for use in downhole seal applications
12/04/2007	US7304019 For use in oilfield treatments; water-soluble materials in non-aqueous carrier fluids using suspension agents that include organophilic clays; surfactant-free
12/04/2007	US7303813 Protective layer against wear based on artificial resin, method for the production thereof and use of the same
12/04/2007	US7303601 Slurries comprising mixtures of silica sol, hydrogen peroxide, 1-hydroxyethylidene-1,1-diphosphonic acid and water, used for planarization of nickel phosphide plated substrates; high density magnetic recording media; disk drives
12/04/2007	US7303600 Applying a paste of perlite ore grains, applying an abrasive force to the paste, fracturing the ore to yield a final polishing composition
12/04/2007	CA2407467C Thermosetting composition
12/04/2007	CA2226459C Resin composition and usage thereof
12/04/2007	CA2214289C Condensation cross-linking polysiloxane masses, a process for preparing the same and surface-modified fillers
11/2007
11/30/2007	CA2590886A1 Corrosion-inhibiting deicer composition
11/30/2007	CA2587238A1 Supported antistatic polymerization catalysts
11/29/2007	WO2007136864A2 Superabrasive tools having improved caustic resistance
11/29/2007	WO2007135937A1 Fluoroelastomer composition and molded article comprising the composition
11/29/2007	WO2007135794A1 Slurry for chemical mechanical polishing, method of chemical mechanical polishing and process for manufacturing electronic device
11/29/2007	WO2007134953A1 Suppression of dust
11/29/2007	WO2007134842A1 Environmentally-friendly oil binding agent for use on liquids and land
11/29/2007	WO2007134822A1 Binding agents and detergent builders modified with vegetable oils and vegetable oil derivatives
11/29/2007	WO2007113658A3 Antifreeze composition
11/29/2007	WO2007113643A3 Abrasive compact material
11/29/2007	WO2006099194A3 Double-sided and multi-layered pcbn and pcd abrasive articles
11/29/2007	US20070276058 Polyurethane composition
11/29/2007	US20070275260 Palladium-containing particles, method and apparatus of manufacturing palladium-containing devices made therefrom
11/29/2007	US20070275221 Near-infrared absorption film
11/29/2007	US20070275170 Low dust wall repair compound
11/29/2007	US20070272589 Allowance Method for Point to Ground Resistance of Tray
11/29/2007	US20070272120 Block and method of making
11/29/2007	US20070271709 Method and composition for avoiding staining during hair coloring
11/29/2007	DE102007024459A1 Chemisch-mechanisches Polierkissen Chemical mechanical polishing pad
11/29/2007	DE102007004757A1 Fällungskieselsäuren mit speziellen Oberflächeneigenschaften Precipitated silicas with special surface properties
11/29/2007	DE102006024727A1 Mit Wasser verdünnbares Konzentrat zur Beschichtung verschiedener Substrate Dilutable concentrate for coating various substrates
11/29/2007	DE102006024590A1 Hydrophile Kieselsäure für Dichtungsmassen Hydrophilic silica for sealants
11/29/2007	CA2651863A1 Suppression of dust in dewatered particulate mineral material
11/28/2007	EP1860688A1 Abrasive for semiconductor integrated circuit device, method for polishing semiconductor integrated circuit device and semiconductor integrated circuit device manufacturing method
11/28/2007	EP1860070A1 A particle comprising a host lattice and a guest, its preparation and use in ultraviolet light screening compositions
11/28/2007	EP1860067A1 Precipitation chart with special surface properties
11/28/2007	EP1860066A2 Hydrophilic silica for sealing compounds
11/28/2007	EP1771524A4 Chelate compound-containing composition and use as detergents thereof
11/28/2007	EP1326902B1 Degradable, amorphous, fluoroacrylate polymers
11/28/2007	EP1303573A4 Non-toxic ethylene glycol-based antifreeze/heat transfer fluid concentrate and antifreeze/heat transfer fluid
11/28/2007	EP1058619B1 Weatherable coating and stain system for thermoset or thermoplastic composite surfaces
11/28/2007	CN101080469A Surface hardening composition for preventing flying dust
11/28/2007	CN101077968A Pneumatic tyre leak-proof composition
11/28/2007	CN101077967A Epoxy resin composition for enveloping semiconductor and semiconductor device
11/28/2007	CN101077966A Preparation and using method for sealing strand
11/28/2007	CN101077965A Inner tube free and vacuum tyre self-complementing glue and use method thereof
11/28/2007	CN101077958A Polyurethane hard bubble water-proof thermal insulation material
11/28/2007	CN101077923A Transparent epoxy nano composite material and its preparation method and use
11/28/2007	CN100351340C Formable water-dispersing plastic bodies and method for the production thereof
11/28/2007	CN100351339C Water and oil repellent composition
11/28/2007	CN100351338C Cerium polishing agent and method for producing cerium polishing agent
11/28/2007	CN100351314C Water-proofing agent of water based type organic silicon resin and preparation process thereof
11/28/2007	CN100351294C Optically clear and antistatic pressure sensitive adhesives
11/27/2007	US7300974 Rheology regulators such as ground natural calcium carbonates optionally treated with a fatty acid or salt and their use
11/27/2007	US7300964 Carbon black
11/27/2007	US7300874 Chemical mechanical polishing compositions and methods relating thereto
11/27/2007	US7300603 Aqueous solution mixture of oxidizer and abrasive; using polymaleic acid; acidity pH
11/27/2007	US7300602 Selective barrier metal polishing solution
11/27/2007	US7300487 Sealing material, method for sealing honeycomb structure and sealed honeycomb structure
11/27/2007	US7300480 Comprises oxidizer (hydrogen peroxide), inhibitor of nonferrous metal, abrasive, complexing agent, imine derivatives (acetamidine hydrochloride), hydrazine derivatives (carbohydrazide), and water; for use with polyurethane polishing pads; for semiconductor substrates
11/27/2007	US7300478 Polyacrylic acid, high purity cerium oxide and optionally rare earth oxides aqueous dispersion containing polysaccharide to retard hard settling; polishing glass and ceramics
11/27/2007	CA2379486C Synergistic combinations of carboxylates for use as freezing point depressants and corrosion inhibitors in heat transfer fluids
11/26/2007	CA2589835A1 Renewable process for manufacturing ground and soil treatment compounds using plant by-products
11/22/2007	WO2007133827A1 Sealer composition
11/22/2007	WO2007133614A2 Bis-quaternary ammonium cyclophane compounds that interact with neuronal nicotinic acetylcholine receptors
11/22/2007	WO2007132933A1 Method for producing polishing composition
11/22/2007	WO2007131895A1 Method for filling in building joints
11/22/2007	WO2007106372A3 Carbon dioxide sequestration materials and processes
11/22/2007	WO2007084302A3 Production of multifunctional granular medium by partial activation of partially decomposed organic matter
11/22/2007	WO2005076871A3 Lapping composition and method using same
11/22/2007	US20070270517 Mixtures Containing 1,1,1,3,3-Pentafluorobutane and 1,1,1,2,3,3,3-Heptafluoropropane
11/22/2007	US20070270509 Nitrated extreme pressure additives and blends
11/22/2007	US20070267604 Carbon composite near-net-shape molded part and method of making
11/22/2007	US20070267598 Non-silica containing impression and casting materials
11/22/2007	US20070267350 Pumice Stone with a Carbon Content, Process for Its Production and Its Applications
11/22/2007	US20070266642 Abrasive, method of polishing target member and process for producing semiconductor device
11/22/2007	US20070266641 Method of polishing a tungsten-containing substrate
11/22/2007	US20070266640 Includes aqueous dispersion solution of fumed silica; efficiently polishing semiconductor device such as wafer at high polishing speed without causing flaw
11/22/2007	US20070266639 Superabrasive tools having improved caustic resistance
11/22/2007	CA2654721A1 Reduced dusting gypsum composites and method of making them
11/22/2007	CA2651504A1 Sealer composition for exposed wood
11/21/2007	EP1857519A1 Thermally foamable microsphere, process for producing the same, and composition
11/21/2007	EP1856229A2 Polishing slurries and methods for chemical mechanical polishing
11/21/2007	EP1856224A1 Polishing slurry composition for improving surface quality of silicon wafer and method for polishing silicon wafer using the same
11/21/2007	EP1855862A1 Injection molding process, apparatus and material for forming cured-in-place gaskets
11/21/2007	EP1395641B1 Artificial testing soil and method of testing
11/21/2007	EP0563305B2 Use of constant boiling compositions of fluorinated hydrocarbons
11/21/2007	CN101076840A Fluid mixture for testing the operation of a smoke detector
11/21/2007	CN101076839A Gas mixture for testing the functioning of smoke detectors
11/21/2007	CN101076746A Wavelength-selective absorption filter
11/21/2007	CN101075665A Solid oxide fuel cell sealing material bettween 500-800 deg.C intermediate temperature and its production
11/21/2007	CN101074662A 制冷剂压缩机 Refrigerant compressor
11/21/2007	CN101074357A Modifed asphalt waterproof curling material of environmental-protective plastic
11/21/2007	CN101074356A Production of low-sodium and chlorine environmental-protecting snow rmeover
11/21/2007	CN101074355A Cement-based penetrant crystalline waterproof material and its production
11/21/2007	CN101074354A Production of composite waterproof hung-laying curling material of self-adhesive and high-strength rubber
11/21/2007	CN101074353A Production of building jointing agent

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