Patents for C09K 3 - Materials not provided for elsewhere (52,772)
10/2008
10/08/2008CN100424845C Semiconductor device and manufacturing method of the same
10/08/2008CN100424571C Liquid crystal sealing agent and liquid crystalline display cell using the same
10/08/2008CN100424120C Friction material for vehicles without asbestos and metal
10/08/2008CN100424067C Improved low-color ultraviolet absorbers for thermoplastic and thermoset high uv wavelength protection applications
10/07/2008US7431945 Allergen remover
10/07/2008US7431758 Heating a cerium carbonate hydrate while supplying a humidified gas to obtain cerium oxide powder having narrow particle diameter distribution;in the productivity and a reduction in the cost of a polishing; abrasive for final finish of silica substrate
10/07/2008CA2514428C Preformed compositions in shaped form
10/07/2008CA2436252C Abrasive grain on the basis of a1203 and zro2, a method for its production, as well as its use
10/06/2008CA2629050A1 Process for the manufacture of carbon nanotubes from renewable raw materials
10/02/2008WO2008117845A1 Moisture-curable composition, and adhesive composition and sealing agent composition each containing the same
10/02/2008WO2008117780A1 Agent for prevention of deposition of silica-containing stain, and method for prevention of deposition of silica-containing stain
10/02/2008WO2008117593A1 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device
10/02/2008WO2008117592A1 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device
10/02/2008WO2008117573A1 Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing method, and method for manufacturing semiconductor device
10/02/2008US20080242778 reacting crude mineral clay with quaternary ammonium or phosphonium salt in non-aqueous solvent to obtain ion-exchanged organoclay suspended in the non-aqueous solvent and a solid residue with impurities; then separating out solid residue by evaporation or filtration; one pot process; polymer intercalate
10/02/2008US20080242743 organodisilane or carbosilane compounds; spreading agents; extremely resistant towards extreme environment conditions, in particular they maintain their acitivity in a wide pH range of about 5 to about 10
10/02/2008US20080242091 Mixture of tetrazole compound and abrasive grains with oxidizer
10/02/2008US20080242090 Metal-polishing liquid and polishing method
10/02/2008US20080241800 Dental Composition For Detection of Carious Tissue, Detection Method
10/02/2008US20080241389 Reduced volatile organic compound emissions and substrate wastage; faster start up to establish print quality; lithography; water, hydrocarbon distillate and low hydrophilic lipophilic balance surfactant
10/02/2008US20080237543 Major crystalline phases of yttrium oxide solid solution in which zirconium oxide is dissolved in yttrium oxide and a zirconium oxide solid solution in which the yttrium oxide is dissolved in the zirconium oxide; used in semiconductor manufacturing apparatus; bending strength, fracture toughness
10/02/2008US20080237538 Process for Preparing Lithium Amide and a Composition Obtainable by Said Process
10/02/2008US20080237535 Fumed silica particles produced by wet grinding having a specific surface area of 50 to 200 m2/g, an average particle diameter of 10 to 50 nm, and an average ratio A/B of the major axis A to the minor axis B of the fumed silica particles of 1.2 to 2.0
10/02/2008US20080237118 Polyamide Reverse Osmosis Composite Membrane and Preparation Method Thereof
10/02/2008US20080236390 an aqueous solution of 1-amino-2-methylpropan-2-ol or amino-di-tert-butyl alcohol and optionally other amines, having oxidation resistance, used for absorption of carbon dioxide from bacterial decomposition, oxidation, composting or storage of waste materials comprising organic substances
10/02/2008US20080236051 Low cost production; grinding life; heat softening then hardening; bonding glass bodies together in three dimensional structure
10/02/2008US20080236050 Abrasives produced by calcination of cerium carbonate having hexagonal crystal structure; improving chemical mechanical polishing selectivity of silicon oxide layer to silicon nitride layer
10/02/2008DE102007015450A1 Beschichtung für Dampfkondensatoren Coating for steam condensers
10/02/2008DE102007015261A1 Reactive mass for substrate application, preferably for the generation of a glop-top, comprises a thermally initiable matrix forming material and an energy absorbing initiator, where the initiator is soluble in the reactive mass
10/02/2008DE102007015083A1 Flammgeschützte Klebe- und Dichtmassen Flame-retardant adhesive and sealing materials
10/01/2008EP1975148A1 Aromatic compound gelatinizing agent having perfluoroalkyl group
10/01/2008CN201125225Y Resin expanded graphite composite oil absorption felt for adsorbing water oil pollution
10/01/2008CN201125224Y Metallic compounded rubber seal plate
10/01/2008CN101278028A Sealing material for flat panel display
10/01/2008CN101275065A Lapping liquid
10/01/2008CN101275064A Sealing glue for filling port of lithium battery and preparation thereof
10/01/2008CN101275063A Ultraviolet-resistant material, sealing member, buffer member, shading member and light source apparatus
10/01/2008CN101275057A Metal-polishing liquid and polishing method
10/01/2008CN101274379A Method of grinding and processing gear wheel
10/01/2008CN100422263C Obturator-type silicone rubber foam material, and its preparing method and use
10/01/2008CN100422259C Polymer self-repair sealing material
10/01/2008CN100422224C Water soluble or water dispersible fluoro chemical silanes for rendering substrates oil and water repellent
10/01/2008CN100421822C Method for coating photochemical catalyst composition on surface of article and article surface coating agent
09/2008
09/30/2008US7429626 Synthetic perovskite with high aspect ratios
09/30/2008US7429367 Chemical mechanical polishing; heat treatment
09/30/2008US7429338 chemical mechanical polishing a semiconductor with an abrasive having a MIXTURE on the surface, CONTAINING STABILIZER, CATALYST, OXIDIZER
09/30/2008CA2367869C Intumescent fire sealing composition
09/25/2008WO2008027510A3 Sour-gas sweetening solutions and methods
09/25/2008US20080233836 Polishing composition and polishing method
09/25/2008US20080233422 Coated nickel-containing powders
09/25/2008US20080233407 Oxide of zinc, boron, alkaline earth metal and optionally lithium; environmentally friendly; lower firing temperature
09/25/2008US20080233341 Special Aminoalkylsilane Compounds as Binders for Composite Materials
09/25/2008US20080233329 Minute structure and information recording medium
09/25/2008US20080233061 Alkyl ether sulfate surfactant, alkyl sulfate surfactant, alkanolamide surfactant,amphoteric surfactant, and electrolyte; opacity, yield strength; sodium trideceth sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, sodium lauroamphoacetate, coco monoethanolamide, ammonium chloride, citric acid
09/25/2008US20080230744 Deoxidant Composition
09/25/2008US20080230742 Hollow element filled curable body repair compounds
09/25/2008US20080230740 Engine cooling; mixture of glycerol, water and additives
09/25/2008US20080230567 Seal For A Dispensing Apparatus
09/25/2008DE19839603B4 Destatisierende thermoplastische Harzzusammensetzung und deren Verwendung Destaticizing thermoplastic resin composition and the use thereof
09/25/2008DE102007013077A1 Wässrige Anstrichmittel Aqueous paints
09/24/2008EP1485440B1 Free radical-forming activator attached to solid and used to enhance cmp formulations
09/24/2008CN101273171A Treatment for paper and method for treatment of paper
09/24/2008CN101270790A Bicycle disk brake pad
09/24/2008CN101270273A Wetter for inhibiting bug dust of plumbum zincium
09/24/2008CN101270272A Composite wetter for cleaning atmosphere floating dust
09/24/2008CN101270261A Ice and snow resistant, anti-corrosion paint and uses thereof
09/24/2008CN101270029A Azeotrope-like compositions of 1,1,1,3,3-pentafluorobutane and hydrogen fluoride
09/24/2008CN100420727C Fiber mixture reinforced friction material and its prepn
09/23/2008US7427406 Aerosols
09/23/2008US7427361 Chemical mechanical polishing slurry for semiconductors
09/23/2008US7427305 Free radical-forming activator attached to solid and used to enhance CMP formulations
09/18/2008WO2008111704A1 Liquid composition of non-chlorinated compound for removing snow or ice and method for removing snow or ice
09/18/2008WO2008111690A1 Flexible resin composition and sealing part for waterproof connector
09/18/2008WO2008111598A1 Curable composition
09/18/2008WO2008111323A1 Moisture-curable urethane composition for waterproof material and urethane waterproof material
09/18/2008WO2008111239A1 Antistatic agent and use thereof
09/18/2008WO2008111134A1 Surface-hydrophobicized film, material for formation of surface-hydrophobicized film, wiring layer, semiconductor device and process for producing semiconductor device
09/18/2008WO2007124905A3 Abrasive grain based on melted spherical corundum
09/18/2008US20080227669 Base fluid containing alpha, beta unsaturated aldehyde, sulfur containing compound and nitrogen containing surfactant; subterranean formations; wide temperature range operation; environmentally friendly
09/18/2008US20080227668 Corrosion-inhibiting additives, treatment fluids, and associated methods
09/18/2008US20080227370 Substrate for magnetic disk
09/18/2008US20080227296 Acidic aqueous solution, amphoteric surfactant/corrosion inhibitor; glycol selected from diethylene glycol, ethylene glycol, and polyoxyethylene glycol; hydrogen peroxide, benzoyl peroxide, barium peroxide, calcium peroxide or sodium peroxide; applied to tungsten layer
09/18/2008US20080224106 Process for treating compositions containing uranium and plutonium
09/18/2008US20080224094 Method of Producing Chlorine Gas, Aqueous Sodium Hypochlorite Solution and Liquid Chlorine
09/18/2008US20080224082 Valves
09/18/2008US20080223254 Production of ceramic, glass ceramic and other mineral materials and composite materials
09/18/2008US20080222967 Includes abrasive grains within a bond matrix, the abrasive grains including cubic boron nitride and the bond matrix including a polycrystalline ceramic phase
09/18/2008US20080222965 Bonded abrasive article and method of making
09/18/2008DE102007012757A1 Filmbildende Zusammensetzung, ihre Herstellung und Applikation, ihre Verwendung zur direkten Entfernung verschmutzter und verunreinigter Oberflächen, die insbesondere keine präventiven Schutzschichten haben sowie Anwendungsset, das diese Zusammensetzung enthält Film-forming composition, their preparation and application, their use for direct removal of soiled and contaminated surfaces in particular have no preventive protective coatings and application set that contains this composition
09/18/2008DE102007012544A1 Regulating means for the absorption of humidity through human skin, comprises particles with dimensions applied on the layer or substrate, where the dimensions are smaller than opening diameter of the pores, water and/or organic solvent
09/17/2008EP1970403A1 Closed cell foam rubber sheet, laminate, and waterproof/watertight sealing material using the sheet or lamiante
09/17/2008EP1191113B1 Metal-collecting apparatus and method for elution and recovery of metal from metal-collecting material
09/17/2008CN101268165A Deicing composition
09/17/2008CN101268164A Non-cryogenic process for granulating polymer drag reducing agents
09/17/2008CN101268016A Ceria based glass polishing composition and a process for the manufacture thereof
09/17/2008CN101265975A Gasket material
09/17/2008CN101265405A Antistatic film material and its preparation method
09/17/2008CN101265404A Permanent antistatic copolymer material and processing method thereof
09/17/2008CN101265403A Engineering structure fast-hardening plugging agent and preparation method thereof
09/17/2008CN101265402A Water-proof sealing adhesive tape and its preparation method