Patents
Patents for C08F 34 - Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring (429)
07/2006
07/27/2006US20060167284 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
05/2006
05/11/2006US20060099476 high softening temperature higher than the conventional perfluorosulfonic acid polymer; strength; catalyst layer; copolymer of tetrafluoroethylene and a perfluorinated 2-methylenedioxolanealkylsulfonic acid or a perfluorinated 2-methyldioxole 2-alkylsulfonic acid
04/2006
04/27/2006WO2006043539A1 Light-emitting compound, light-emitting polymer compound and light-emitting device
04/25/2006US7033729 Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same
04/05/2006EP1558654A4 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
12/2005
12/13/2005US6974658 Used in manufacturing a semiconductor device
10/2005
10/25/2005US6958145 Synthesis of cyclic compounds
10/13/2005WO2005096422A1 Electrolyte material for solid polymer type fuel cell, electrolyte membrane and membrane electrode assembly
09/2005
09/28/2005CN1675191A Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer
09/28/2005CN1675179A Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
09/15/2005WO2005085303A1 Curable composition and process for producing cured fluorochemical
08/2005
08/03/2005EP1558654A2 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
08/02/2005US6924079 Resist resin, chemical amplification type resist, and method of forming of pattern with the same
07/2005
07/12/2005US6916543 Chemical amplification; organosilicon moieties; binder resins; etching resistant; photolithography
07/07/2005US20050147897 Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer
06/2005
06/30/2005US20050142491 Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
06/29/2005EP1548014A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same
06/15/2005EP1539690A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
05/2005
05/31/2005US6899990 Epoxy compound having alicyclic structure, polymer, resist composition and patterning process
02/2005
02/24/2005WO2004014960A3 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
02/09/2005EP1294705A4 Synthesis of cyclic compounds
12/2004
12/15/2004CN1555387A Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
12/02/2004US20040242820 preparing transparent films at 157 nm; solutions of perfluorodioxole polymers with stable, nonionic end groups in perfluorinated solvents are sintered and pelletized for infrared spectrum analysis
12/01/2004CN1550509A Perfluorinated polymers
11/2004
11/11/2004US20040225094 addition-condensation copolymer containing peroxyalkylene glycol and unsaturated fluorine compound
11/03/2004CN1542026A Amorphous perfluorinated polymers
10/2004
10/27/2004EP1470446A1 Organic anti-reflective coating compositions for advanced microlithography
10/20/2004EP1469016A1 Perfluorinated polymers
10/20/2004EP1469015A1 Amorphous perfluorinated polymers
10/19/2004US6806025 Photoresist monomers, polymers thereof and photoresist compositons containing the same
10/14/2004WO2004088422A1 Fluoro compound and fluoropolymer
09/2004
09/21/2004US6794051 Cycloolefin copolymer having a glass transition temperature of less than 120 degrees c.; biaxially oriented; especially suitable for packaging foods
09/21/2004CA2132846C Fluorine-containing polymers and preparation and use thereof
09/07/2004US6787287 Photosensitive polymers and resist compositions comprising the photosensitive polymers
09/01/2004CN1164626C Conjugated polymer containing oxdiazole and its application
08/2004
08/26/2004DE10305807A1 Production of polymethylenamine, e.g. cationic fixative, dehydrating agent, flocculant or retention aid for paper industry, involves free radical polymerization of imidazol(in)e or 1,3,2-diazasilacyclo-pent(adi)ene and optional hydrolysis
07/2004
07/15/2004WO2004040371A3 Novel copolymer and photoresist compositions thereof
07/15/2004US20040137362 interpolymers of cyclic siloxane acrylates, e.g., 3-(3,5,7,9,11,13,15-heptaethylpentacyclo [9.5.1.13.9.15.15.17.13]octa-siloxan-1-yl) propyl methacrylate; high resolution photolithography
06/2004
06/10/2004US20040110966 2-methylenetetrahydro-2(5H)-furanone derivatives, their preparation from 4-oxovaleric acids, and homo-and copolymers of the furanones
05/2004
05/13/2004WO2004040371A2 Novel copolymer and photoresist compositions thereof
03/2004
03/30/2004US6713228 Unsaturated ether containing polymer
03/23/2004US6710188 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
03/04/2004WO2004018443A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same
02/2004
02/25/2004CN1139585C Preparation method of vinylene carbonate and its application
02/19/2004WO2004014960A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
02/12/2004WO2004013207A1 Polymethylene amine, method for the production and use thereof
02/05/2004DE10233930A1 Polymethylenamin, Verfahren zu seiner Herstellung und seine Verwendung Polymethylenamin, process for its preparation and its use
01/2004
01/13/2004US6677175 Optical waveguides and methods for making the same
12/2003
12/25/2003US20030235781 Used in manufacturing a semiconductor device
12/04/2003US20030224297 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
12/04/2003US20030224191 Transparent polyester film with enhanced water vapor barrier, its production and use
12/03/2003EP1366896A1 Transparent polyester film with improved barrier to water vapour, method of preparation and usage
11/2003
11/13/2003US20030211734 Resist resin, chemical amplification type resist, and method of forming of pattern with the same
10/2003
10/28/2003US6639084 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
10/01/2003CN1446232A Anionic vinyl/dicarboxylic acid polymers and uses thereof
09/2003
09/10/2003EP1342110A2 Optical waveguides and methods for making the same
06/2003
06/26/2003WO2002010810A3 Optical waveguides and methods for making the same
06/04/2003CN1421470A Conjugated polymer containing oxdiazole and its application
05/2003
05/22/2003US20030097008 Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
05/07/2003EP1307493A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
03/2003
03/26/2003EP1294705A1 Synthesis of cyclic compounds
03/25/2003US6538087 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
03/13/2003US20030050398 Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
02/2003
02/20/2003US20030036603 E.g., spiro(7-oxa-5-norbornene-2,3'- succinic anhydride, -tetrahydrofuran-2'-one, and -(2',2'-dimethyl)tetrahydrofuran))
02/12/2003EP1282654A2 Anionic vinyl/dicarboxylic acid polymers and uses thereof
02/04/2003US6515091 Anionic vinyl/dicarboxylic acid polymers and uses thereof
01/2003
01/15/2003CN1391664A Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
01/02/2003US20030003379 Photoresist monomers, polymers thereof and photoresist compositons containing the same
12/2002
12/05/2002US20020183471 2,2,5-trifluoro-4-perfluoroalkyl-1,3-dioxoles; use to make copolymers with higher glass transition temperature; use coating optical fibers, electrical wires, and as dielectrics
11/2002
11/20/2002CN1094488C Polymerizable urea/ureido functional monomers
10/2002
10/31/2002US20020160303 Unsaturated ether containing polymer
10/22/2002US6469185 Perfluorodioxoles
10/22/2002US6469116 For optical, electronic and chemical applications
10/10/2002US20020146642 Lithography characteristics when used as photoresist material
09/2002
09/11/2002EP1238310A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
09/11/2002EP1238309A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
08/2002
08/08/2002US20020107407 Reacting monohaloethylene carbonate with dehydrohalogenating agent (triethyleneamine) in presence of ethylene carbonate
08/01/2002US20020103317 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
07/2002
07/11/2002WO2002010231A3 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
06/2002
06/13/2002WO2002046811A1 Plastic optical fiber
05/2002
05/30/2002US20020065383 For optical, electronic and chemical applications
05/30/2002US20020064896 Curing a cladding layer to form a core/cladding combination and removing the core/cladding to expose a portion of the core that has refractive index .05% higher than the cured cladding composition
05/28/2002US6395908 Process for the preparation of vinylene carbonate, and the use thereof
05/10/2002WO2002036646A1 High-molecular compounds for photoresists, monomeric compounds, photosensitive resin compositions, method for forming patterns with the compositions, and process for production of electronic components
04/2002
04/25/2002US20020049291 Hydroxyl-containing polymer of given formula, such as hydrolysed maleic anhydride-vinyl acetate copolymer; abrasion resistant coatings for fertilizer; coated seeds
03/2002
03/19/2002US6359153 Photoresist monomers and preparation thereof
03/14/2002WO2001082869A3 Anionic vinyl/dicarboxylic acid polymers and uses thereof
02/2002
02/14/2002US20020018960 High etching resistance, heat resistance and adhesiveness; low ultraviolet light absorbance; can be developed in aqueous tetramethylammonium hydroxide solution; for fabricating circuits for high integration semiconductors
02/07/2002WO2002010810A2 Optical waveguides and methods for making the same
02/07/2002WO2002010231A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same
01/2002
01/17/2002WO2002005034A1 Resist resin, chemical amplification type resist, and method of forming pattern with the same
01/03/2002WO2002000639A1 Synthesis of cyclic compounds
01/03/2002CA2413336A1 Synthesis of cyclic compounds
01/01/2002US6335408 Glass transition temperature
11/2001
11/08/2001WO2001082869A2 Anionic vinyl/dicarboxylic acid polymers and uses thereof
10/2001
10/16/2001US6303725 Cyclic dione polymer
09/2001
09/18/2001US6291216 Aliphatic hydroxy base bonded to oxirane-containing polymer through thiophilic or metal chelation group ligand; immobilized enzymes; chromatography
09/04/2001US6284429 For formulating photoresists having sensitivity, resolution, etching resistance
08/2001
08/21/2001US6277538 Photosensitive polymer having cyclic backbone and resist composition comprising the same
07/2001
07/25/2001CN1304935A Preparation method of vinylene carbonate and its application
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