| Patents for C08F 234 - Copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring (327) |
|---|
| 09/06/2006 | EP0984053B1 Photochromic polymerizable composition |
| 08/24/2006 | US20060189788 Cyclic ether copolymer, coating resin composition, optical devices, and process for production of the devices |
| 07/27/2006 | US20060166129 copolymer of ethylenically unsaturated monomer having one or more fluorine group and a polycyclic unsaturated monomer having one or more ester groups; coating, imagewise exposing the photoresist layer, developing |
| 05/16/2006 | US7045267 Resist composition comprising photosensitive polymer having lactone in its backbone |
| 04/11/2006 | US7026440 Branched water soluble polymers containing atleast two arms, such as polyoxyethylene glycol, linked to a central aliphatic hydrocarbon core molecule through heteroatom linkage and one functional group for reacting biological active agent |
| 02/16/2006 | WO2006016925A1 Photosensitive compositions based on polycyclic polymers |
| 02/09/2006 | US20060030673 Oxygen-containing heterocyclic fused naphthopyrans |
| 02/07/2006 | US6995223 3,4-alkylenedioxy-thiophene copolymers |
| 01/26/2006 | US20060020068 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| 11/08/2005 | US6962768 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same |
| 10/06/2005 | US20050221221 Sensitive to high-energy radiation, resolution, and etching resistance |
| 09/28/2005 | CN1675262A Fluorinated polymers useful as photoresists, and processes for microlithography |
| 08/30/2005 | US6936668 cyclic perfluorinated units deriving from at least two different perfluorinated units, and units deriving from a non cyclic perfluorinated monomer, or which does not cyclize during the polymerization and containing olefinic unsaturation |
| 08/02/2005 | US6924078 Multi-oxygen-containing compound which with polymerizable carbon-carbon double bond and ethyleneoxy moiety |
| 07/26/2005 | US6921622 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 07/13/2005 | EP1551886A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 07/13/2005 | CN1637027A Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same |
| 04/27/2005 | CN1609127A Polymer based on CTFE/VCA/HFP or TFE/VCA/HFP |
| 04/21/2005 | US20050084230 Polymers based on CTFE/VCA/HFP or TFE/VCA/HFP |
| 03/09/2005 | CN1192045C Synthesis of copolymers containing anhydrofructose derivatives |
| 02/01/2005 | US6849376 Polymers and photoresist compositions comprising same |
| 01/13/2005 | US20050009944 Amorphous perfluorinated copolymers |
| 01/13/2005 | US20050008975 Chemical resistance; bonding strength; accuracte patterns; photolithography |
| 12/28/2004 | US6835529 Polymer having butadiene sulfone repeating unit and resist composition comprising the same |
| 12/15/2004 | CN1555387A Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 11/30/2004 | US6824955 Polymers, resist compositions and patterning process |
| 11/24/2004 | EP1479702A1 Polymers of chlorotrifluoroethylene/vinylene carbonate/hexafluoropropene or tetrafluoroethylene/vinylene carbonate/hexafluoropropene |
| 11/19/2004 | CA2469831A1 Ctfe/vca/hfp or tfe/vca/hfp polymers |
| 10/28/2004 | WO2004092235A1 Cyclic ether copolymer, coating resin composition, optical devices, and process for production of the devices |
| 10/26/2004 | US6809166 Amorphous perfluorinated copolymers |
| 09/02/2004 | US20040170919 co-/terpolymers comprising vinyl ethers and acrylic esters, used in mixtures with acid generators, bases and solvents to form photoresists having etch reistance and bonding strength; photolithography |
| 07/28/2004 | CN1159319C Novel monomer and its polymer used for anti-photoetching agent, and their compositions |
| 07/27/2004 | US6767942 Miscible organometallic; superconductivity |
| 05/20/2004 | US20040097677 Optical fibers; vinylene carbonate with chlorotrifluoro-ethylene or tetrafluoroethylene; transparent; visible and/or near infrared region; heat resistance; antireflective films |
| 05/20/2004 | US20040097676 Polymeric optical fibers; terpolymer of such as tetrafluoro-ethylene, vinylene carbonate and ethylene glycol vinyl ether; heat resistance; transparent; simple, rapid ultraviolet radiation curing |
| 03/24/2004 | EP1226194B1 Synthesis of copolymers containing anhydrofructose derivatives |
| 03/03/2004 | CN1478800A Photoetch resist copolymer |
| 02/26/2004 | WO2004016664A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 01/29/2004 | US20040018442 Resist composition comprising photosensitive polymer having lactone in its backbone |
| 01/22/2004 | US20040014853 Coatings having fully fluorinated co-solubilizer, metal material and fluorinated solvent |
| 01/21/2004 | EP1382646A1 Coatings having fully fluorinated co-solubilizer, metal material and fluorinated solvent |
| 01/13/2004 | US6677175 Optical waveguides and methods for making the same |
| 11/25/2003 | US6653047 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 11/20/2003 | US20030215758 Photosensitive polymer and chemically amplified resist composition comprising the same |
| 11/19/2003 | CN1456580A Photosensitive polymer and amplified chemical photoresist agent composition containing it |
| 09/30/2003 | US6627382 Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser |
| 09/25/2003 | US20030180661 Polymer having butadiene sulfone repeating unit and resist composition comprising the same |
| 09/10/2003 | EP1342110A2 Optical waveguides and methods for making the same |
| 09/04/2003 | US20030165773 Polymers, resist compositions and patterning process |
| 06/26/2003 | WO2002010810A3 Optical waveguides and methods for making the same |
| 05/28/2003 | CN1420133A Partial fluorinated amorphous copolymer capable of producing photoconductive material |
| 05/28/2003 | CN1420132A Cross-linkable functional polymer capable of producing photoconductive material |
| 05/21/2003 | EP1312628A1 Curable functional polymer for the preparation of light conducting materials |
| 05/21/2003 | EP1312626A1 Amorphous partically fluorinated copolymer for the preparation of light conducting materials |
| 05/19/2003 | CA2406327A1 Partially fluorinated amorphous copolymer for use in manufacturing light conducting materials |
| 05/19/2003 | CA2406324A1 Functional cross-linkable polymer for use in manufacturing light conducting polymers |
| 05/15/2003 | US20030091927 Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion |
| 05/08/2003 | US20030088039 Composition |
| 05/07/2003 | EP1307493A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 04/03/2003 | WO2002069038A3 Novel polymers and photoresist compositions comprising same |
| 03/25/2003 | US6538087 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 03/25/2003 | US6537727 Resist composition comprising photosensitive polymer having loctone in its backbone |
| 02/13/2003 | US20030031949 Novel polymers and photoresist compositions comprising same |
| 02/12/2003 | EP0926146B1 Chromene compounds |
| 01/30/2003 | US20030022100 Photoresist monomers, polymers thereof and photoresist compositions containing the same |
| 01/23/2003 | US20030017412 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 01/15/2003 | CN1391664A Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 11/28/2002 | US20020177667 Cyclic perfluorinated units derived from at least two different comonomers; no unstable polar end groups; glass transition temperature >120 degrees C.; optical fibers; higher diameter; flexibility; improved number opening |
| 11/28/2002 | US20020177067 Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser |
| 11/13/2002 | EP1256592A1 Amorphous perfluorinated copolymers |
| 09/24/2002 | US6455225 Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same |
| 09/11/2002 | EP1238310A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 09/11/2002 | EP1238309A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 09/11/2002 | CN1368984A Synthesis of copolymers containing anhydrofructose derivatives |
| 09/06/2002 | WO2002069038A2 Novel polymers and photoresist compositions comprising same |
| 08/20/2002 | US6436606 Polymers and photoresists coating |
| 08/01/2002 | US20020103317 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 07/31/2002 | EP1226194A1 Synthesis of copolymers containing anhydrofructose derivatives |
| 07/11/2002 | WO2002010231A3 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 05/30/2002 | US20020064896 Curing a cladding layer to form a core/cladding combination and removing the core/cladding to expose a portion of the core that has refractive index .05% higher than the cured cladding composition |
| 05/14/2002 | US6387589 Copolymer; semiconductor |
| 04/11/2002 | US20020042016 Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics |
| 04/03/2002 | CN1082061C Cumarim and quinolinone derivatives for preparing liquid crystal orientation layers |
| 03/27/2002 | CN1342173A Polymerization process |
| 03/26/2002 | US6362248 Photochromic polymerizable composition |
| 02/14/2002 | DE10037293A1 Copolymer containing polymerized units of a 1,3-dioxol-2-one and at least one vinyl ether is useful for the production of hydrophilic gels for wound healing, hygiene articles, cosmetics and adhesives. |
| 02/07/2002 | WO2002010810A2 Optical waveguides and methods for making the same |
| 02/07/2002 | WO2002010231A2 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 09/18/2001 | US6291131 Monomers for photoresist, polymers thereof, and photoresist compositions using the same |
| 05/25/2001 | WO2001037044A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 05/25/2001 | WO2001037043A1 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 05/23/2001 | EP1100832A1 A polymerization process |
| 05/10/2001 | WO2001032728A1 Synthesis of copolymers containing anhydrofructose derivatives |
| 05/10/2001 | CA2376778A1 Synthesis of copolymers containing anhydrofructose derivatives |
| 03/13/2001 | US6201087 Coumarin and quinolinone derivatives for the production of orienting layers for liquid crystals |
| 03/06/2001 | US6197225 Chromene compound |
| 12/28/2000 | WO2000079051A1 Preservation of paper and textile materials |
| 12/28/2000 | CA2372697A1 Preservation of paper and textile materials |
| 10/17/2000 | US6132926 Semiconductors |
| 08/29/2000 | CA2055446C Perfluorodioxole membranes |