Patents
Patents for C08F 222 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof (8,242)
02/2002
02/20/2002CN1079404C Vinyl maleic pimarate/vinyl cyanide copolymer and its prepn.
02/19/2002US6348553 Composition for baking finish
02/19/2002US6348537 Coating agent, and resin molded article having coated layer
02/19/2002US6348296 Copolymer resin, preparation thereof, and photoresist using the same
02/14/2002WO2002012403A2 Colorants containing copolymerizable vinyl groups and sulfonamide linkages
02/14/2002WO2002012402A2 Colorant compounds containing copolymerizable vinyl groups
02/14/2002WO2002012400A2 Thermally stable, anthraquinone colorants containing copolymerizable vinyl groups
02/14/2002WO2001070642A3 Radiation-curable coatings suitable for high-speed application onto optical fibers
02/14/2002WO2001044379A3 Uv curable paint compositions and method of making and applying same
02/14/2002US20020018960 High etching resistance, heat resistance and adhesiveness; low ultraviolet light absorbance; can be developed in aqueous tetramethylammonium hydroxide solution; for fabricating circuits for high integration semiconductors
02/12/2002CA2229366C Process for preparing continuously variable-composition copolymers
02/12/2002CA2023666C Heat-curable bismaleimide resins
02/07/2002WO2002010292A1 Dual cure coating compositions having improved scratch resistance, coated substrates and methods related thereto
02/07/2002WO2002009784A1 Acrylic-based adhesive composition
02/07/2002CA2417257A1 Dual cure coating compositions having improved scratch resistance, coated substrates and methods related thereto
02/07/2002CA2416125A1 Acrylic-based adhesive composition
02/06/2002EP1177228A1 Solvent-free copolymers of maleic anhydride and alkyl vinyl ethers having a specific viscosity of 0.5 to 5
02/05/2002US6344495 Heat resistance, softness,a concave-convex pattern
02/05/2002US6344434 Acrylic polymer, process for the production of the same, biodegradable builder, detergent composition and dispersant
01/2002
01/31/2002WO2001045958A3 Thermally imageable element and lithographic printing plate
01/31/2002US20020013444 Coated candles and coating compositions
01/31/2002DE10134163A1 New copolymers, used in photoresist composition for producing resist image, contain recurring units derived from unsaturated carboxylic anhydride, allyltrimethylsilane and 2-alkyl-adamant-2-yl (meth)acrylate
01/31/2002CA2314731A1 Polymer composition derived from unsaturated vegetable oils
01/30/2002EP1176158A1 Polymer composition derived from unsaturated vegetable oils
01/30/2002EP0851948B1 Partial fluoroesters or thioesters of maleic acid polymers and their use as soil and stain resists
01/29/2002US6342571 High refractive index optical resin composition
01/29/2002US6342545 Radical-curable adhesive compositions, reaction products of which demonstrate superior resistance to thermal degradation
01/24/2002WO2002006901A2 Photoresist composition for deep uv and process thereof
01/24/2002WO2002006364A1 Photochromic resins and articles; preparation; precursor compositions
01/24/2002WO2001002449A3 Poly(meth)acrylic photochromic coating
01/24/2002US20020010296 Amphiphilic polymer composition
01/24/2002US20020009650 High electroconductivity
01/23/2002EP1174412A1 Polymerizable composition showing liquid-crystal phase and optically anisotropic object made with the same
01/23/2002EP1173490A1 Copolymers with amphiphilic sub-units, a method for producing the same and the use thereof
01/17/2002WO2002005034A1 Resist resin, chemical amplification type resist, and method of forming pattern with the same
01/17/2002WO2002004533A1 Continuous, solvent-free process for making terpolymers of maleic anhydride, c1-4 alkyl vinyl ether and isobutylene
01/16/2002EP1171491A1 Improved process for producing free radical polymerized copolymers
01/15/2002US6339113 Photopolymerizable composite resin compositions for dental restoration
01/10/2002WO2001036557A3 Adhesive
01/10/2002US20020004178 Photosensitivity, resolution, chemical resistance
01/03/2002US20020002116 By using a water soluble maleic anhydride (co)polymer amidated or modified with an amine or alkanolamine, or polymers made from 2-(aminocarbonyl)acrylic acid or salts thereof
01/03/2002US20020001710 Ceramer composition and composite comprising free radically curable fluorochemical component
01/02/2002EP1168079A1 Photo-curable electrically conductive composition and plasma display panel having electrode formed by use of the same
01/02/2002CN1329644A Hard coating material and film obtained with the same
01/01/2002US6335404 Aqueous process for preparing aqueous weight carboxyl containing polymers
01/01/2002US6335399 Low in rigidity, tensile strength, ductility, molded product shows no sharp edge on rupture cross-section upon collision, has a high resistance to thermal deformation and exhibits an excellent moldability.
12/2001
12/27/2001WO2000078824A9 Hydroxyl group-containing copolymers and their use for producing fuel oils with improved lubricity
12/26/2001CN1328595A Ceramer composition having abrasion and stain resistant characteristics
12/25/2001US6333425 Ionic compounds derived from malononitrile in which anionic charge is delocalized; excellent properties of solubility and dissociation
12/20/2001WO2001096410A1 Continuous, solvent-free process for making copolymers of maleic anhydride and c1-4 alkyl vinyl ether
12/20/2001US20010053834 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
12/20/2001US20010053829 Continuous, solvent-free process for making copolymers of maleic anhydride and C1-4 alkyl vinyl ether
12/19/2001EP1163298A1 Ceramer composition and composite comprising free radically curable fluorochemical component
12/13/2001US20010051316 Micropatterning using electron beams or ultraviolet rays
12/13/2001US20010051315 Polymers, resist compositions and patterning process
12/13/2001US20010051145 Plant safening agents; controlling misting
12/12/2001EP0861280B1 Thermosetting polymers for composite and adhesive applications
12/12/2001CN1325911A Aphiphathic polymer composition
12/12/2001CN1325847A Compound with electron providing and receiving functional groups
12/11/2001US6329483 In cosmetics
12/11/2001US6329482 Polymerizable compositions based on difunctional monomers, resins and ophthalmic articles containing same
12/06/2001WO2001092434A1 Semi-solid one- or two-part compositions
12/06/2001WO2001092432A1 Synthetic resin emulsion and sealer composition containing the same for recoating
12/06/2001WO2001092372A2 Monofunctional monomers, radically polymerisable compositions containing them and resins and ophtalmic articles obtained from them
12/06/2001US20010049419 Polymer from a monomer possessing strong acid functional group (which may be at least partially neutralized), copolymerized with at least one ester of aliphatic C 8-30 alcohol and unsaturated mono- or polycarboxylic acid
12/05/2001EP1160265A1 Amphiphilic polymer composition
12/05/2001EP1159368A2 Pressure-sensitive adhesive compositions and pressure-sensitive adhesive label constructions exhibiting low adhesive residue in printers
12/05/2001EP1109750A4 Process for the inhibition of scale in harsh systems and novel antiscalants for same
12/05/2001CN1075822C Process for synthesis of alternating isobutene-maleic anhydride resin
12/04/2001US6326414 Using an a-hydroxyalkylphenone compound for photopolymerization
11/2001
11/30/2001CA2347441A1 Amphiphilic polymer composition
11/29/2001WO2001074919A8 Polymers
11/29/2001US20010046476 Reactive group covalently bonded to a bactericide, flavorant and/or essential oil compound, hydrolyzable in aqueous solution for slow release
11/28/2001EP1112307A4 Screen coating composition and method for applying same
11/28/2001CN1323842A Hydroscopic resin preparing process
11/27/2001US6322861 Polymer particles
11/22/2001US20010044071 Cycloalkyl-substituted cycloalkyl or cycloalkenyl acrylates; polymers that are sensitive to high energy radiation; patterning using electron beams or deep UV
11/21/2001EP1156036A2 Compounds with electron donor and electron acceptor functionality
11/20/2001US6319654 Preparing a chemical amplification photoresist; coating on a substrate of a semiconductor element to form photoresist film; exposing film to light; silylation; developing to form pattern; etching substrate
11/20/2001US6319428 Perfluorinated amide salts and their uses as ionic conducting materials
11/18/2001CA2347898A1 Compounds with electron donor and electron acceptor functionality
11/15/2001WO2001085812A1 Compositions and methods for the manufacture of ophthalmic lenses
11/15/2001WO2001085099A2 Polymeric delivery and release systems for oral care actives
11/15/2001US20010041303 Mixture of polymer and acid generators
11/14/2001CN1321715A Adhesive of fixing matrix for microelectronic device
11/14/2001CN1074772C Aqueous process for preparing low molecular weight polymers
11/13/2001US6316565 For forming patterns of integrated semiconductor device, resolution in photolithography
11/13/2001US6316554 Process for the production of water-absorbing compositions
11/13/2001US6316162 Polymer and a forming method of a micro pattern using the same
11/13/2001US6315987 Polymeric delivery and release systems for oral care actives
11/08/2001WO2001083393A2 Liquid curable resin composition for optical fibers
11/08/2001WO2001082869A2 Anionic vinyl/dicarboxylic acid polymers and uses thereof
11/08/2001US20010038969 Novel polymers, resist compositions and patterning process
11/07/2001EP1150723A1 Suture material for wounds based on methylidene malonate
11/06/2001US6314225 Halogen and perhalo-organo substituted N-phenyl (or biphenyl) maleimide
11/06/2001US6313251 High index/high abbe number composition
11/06/2001US6313237 Used in optics
11/06/2001US6313189 Polymerizing formulation comprising ethylene glycol or glycero-oligoester (meth)acrylate contained in a porous matrix in the form of the shaped article by means of electromagnetic radiation
11/06/2001US6312865 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
11/06/2001US6312802 Polymers for imparting light resistance to fibers, highly light-resistant fibers, and process for producing the fibers
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