Patents
Patents for C08F 220 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof (34,253)
12/2005
12/14/2005EP1605026A1 Polymeric dispersants
12/14/2005EP1603986A1 Pressure sensitive adhesive composition for electro-magnetic shielding film and electro-magnetic shielding filter using the same
12/14/2005EP1474719A4 Polymerization process and materials for biomedical applications
12/14/2005CN1708553A Thickener for thermoplastic polyester resin, thermoplastic polyester resin composition containing the same, and molded object obtained therefrom
12/14/2005CN1708521A Treating agent for masonry
12/14/2005CN1706542A Polymeric dispersants
12/14/2005CN1231507C Acrylic emulsion coating for films, paper and rubber
12/14/2005CN1231503C Compound and preparing process thereof, anti-reflecting paint compsns. and its application
12/14/2005CN1231292C Particulate compositions and their manufacture method
12/08/2005WO2005116768A1 Positive resist compositions and process for the formation of resist patterns with the same
12/08/2005WO2005116728A1 Contact lens
12/08/2005WO2005116294A1 Coloured conversion layers on metallic surfaces
12/08/2005WO2005116165A1 Polymerizable liquid crystal composition and optically anisotropic body
12/08/2005WO2005116116A1 Resin particles
12/08/2005WO2005116095A1 Organic polymer monolith, process for preparing the same, and uses thereof
12/08/2005US20050272889 (Meth)acrylamide polymer that has low viscosity and good dispersibility and fluidity, which is accomplished by using a cationic monomer having the function of lowering the viscosity of a polymer; provides a paper strengthening effect and an increase in sizing degree
12/08/2005US20050272879 Resin with excellent processability for lightguide plate
12/08/2005US20050271978 Resist polymer, making method, and chemically amplified positive resist composition
12/08/2005DE102004024437A1 Verfahren zur Herstellung wasserquellbarer, polymerer Partikel Process for preparing water-polymeric particles
12/08/2005DE102004023071A1 Pumpbare Tricyclodecandimethylol enthaltende Zusammensetzung Pumpable tricyclodecanedimethylol containing composition
12/07/2005EP1602701A1 Emulsion-type pressure sensitive adhesive and process for producing the same
12/07/2005EP1448692B1 Aqueous synthetic resin preparation
12/07/2005EP1175458B1 Method for producing block-shaped polymethacrylimide foamed materials
12/07/2005CN1230715C Photoresist composition for deep UV and process thereof
12/07/2005CN1230411C Polymerizable composition showing liquid-crystal phase and optically anisotropic object made with the same
12/06/2005CA2356127C Water and oil repellent aqueous dispersion and process for producing it
12/06/2005CA2146479C Polymer
12/01/2005WO2005113690A2 Article comprising fluorochemical surface layer
12/01/2005WO2005113620A1 Biocompatible material
12/01/2005WO2005113619A1 Thickened liquids
12/01/2005WO2005113618A1 Fluorocopolymer, process for producing the same, and molded object
12/01/2005WO2005022257A3 Novel photosensitive bilayer composition
12/01/2005US20050267275 A fluorinated vinyl sulfonate-polyalkenamer-acrylic acid or ester terpolymer with excellent transparency, substrate adhesion, developer penetrability, and plasma etch resistance; lithographic microprocessing; photoresists
12/01/2005US20050267274 Living polymers; telechelic polymers
12/01/2005US20050266351 a copolymer of an adamantanecarbonyloxyalkyl acrylic acid ester and a 2-furanone ester of acrylc acid; acid generator is triphenylsulfonium 1-(3-hydroxymethyl-adamantane)methoxycarbonyldifluoromethanesulfonate or triphenylsulfonium 4-oxo-1-adamantyloxycarbonyldifluoromethanesulfonate;
12/01/2005US20050266339 Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same
12/01/2005US20050265949 Reshapable hair styling composition comprising acrylic copolymers
12/01/2005US20050265948 Copolymers and their use in personal care compositions
12/01/2005DE102004023613A1 Verdickte Flüssigkeiten Thickened liquids
11/2005
11/30/2005EP1599594A1 Enzymatic production of (meth)acrylic acid esters
11/30/2005EP1599281A2 Use of a polymer dispersant as a fluidising agent for hydraulic binder compositions and preparation method thereof
11/30/2005CN1703472A Fast drying coatings
11/30/2005CN1703432A Multi-purpose polymers, methods and compositions
11/30/2005CN1702554A Light sensitive resin composition
11/30/2005CN1702087A Polyacrylic acid salts shrinkage-reducing-agent and method for making same
11/30/2005CN1229545C Aqueous polymeric emulsion compositions and their use for the sizing of paper
11/30/2005CN1229442C Spray drying polymer particls
11/30/2005CN1229408C Polymeric fluid loss additive and method of use thereof
11/24/2005WO2005111104A2 Self-photoinitiating water-dispersable acrylate ionomers and synthetic methods
11/24/2005WO2005111103A1 Solid polymer electrolyte membrane and fuel cell
11/24/2005WO2005111102A1 Polymer for preventing protein adhesion and composition containing the same
11/24/2005WO2005111101A1 Pressure-sensitive adhesive tape and method for production thereof
11/24/2005WO2005111088A1 Method for production of water-swellable polymeric particles
11/24/2005WO2005087685A8 Drying shrinkage-reducing agent
11/24/2005WO2005074868A8 Hair cosmetic material
11/24/2005US20050261433 Acrylic resin
11/24/2005CA2564314A1 Self-photoinitiating water-dispersable acrylate ionomers and synthetic methods
11/24/2005CA2562560A1 Pressure-sensitive adhesive tape and method for production thereof
11/23/2005EP1598373A1 Process for producing aqueous resin dispersion
11/23/2005EP1597301A2 High molecular weight polymers containing pendent salicyclic acid groups for clarifying bayer process liquors
11/23/2005EP1421039B1 Basic-medium-soluble packaging material for use in castable cementitious composites
11/23/2005CN1701106A Pressure sensitive adhesive composition for electro-magnetic shielding film and electro-magnetic shielding filter using the same
11/23/2005CN1699436A Organic anti-reflective polymer and preparation thereof
11/23/2005CN1228359C High molecular polymer of chemical amplification type light resistance agent compsn.
11/23/2005CN1228358C Method for coating plastic moulded products with evaporated metal ultraviolet photocureable priming paint and plastic moulded goods
11/22/2005US6967042 UV curable compositions for producing mar resistant coatings and method for depositing same
11/22/2005CA2329028C A process for the production of paper
11/17/2005WO2005108521A1 Water-soluble thickener and cosmetic preparation containing same
11/17/2005WO2005108519A1 Aqueous resin dispersion for adhesive and composition thereof
11/17/2005WO2005108485A2 Composite materials based on carbon nanotubes and polymer matrices and processes for obtaining same
11/17/2005WO2005108446A1 Fluorine-containing copolymer, method for producing same and resist composition containing same
11/17/2005WO2005108444A1 Lactone copolymer and radiation-sensitive resin composition
11/17/2005WO2005108443A1 Molecule recognition polymer enabling reconstruction of recognition field for target molecule and method of producing the same
11/17/2005WO2005108441A2 Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same
11/17/2005US20050256257 Aqueous polymer dispersion for barrier coating
11/17/2005US20050256255 Film coating
11/17/2005US20050256236 Pumpable composition comprising tricyclodecanedimethylol
11/17/2005US20050254319 Polymer bound donor-acceptor-donor compounds and their use in a 3-dimensional optical memory
11/17/2005US20050252418 Copolymer of an unsaturated monomer containing an ionic functional groups such as, tert-amino, quaternary ammonium salt and sulfonic acid; an polyethoxylated acrylate, ultraviolet absorbing unsaturated monomer and other
11/17/2005DE19753276B4 Amid- oder Imid- enthaltendes Copolymer, Herstellungsverfahren für das Copolymer und dieses Copolymer enthaltendes Photoresist Amide or imide-containing copolymer manufacturing method of the copolymer and this copolymer containing photoresist
11/17/2005DE102005002410A1 New top anti-reflective coating polymer for use in immersion lithography for fabrication of sub-nanomicron semiconductor device
11/17/2005CA2566702A1 Composite materials based on carbon nanotubes and polymer matrices and processes for obtaining same
11/16/2005EP1595896A1 Water-soluble polymers having lowered molecular weights, process for production of the same and usage thereof
11/16/2005EP1595874A1 Pumpable composition comprising Tricyclodecandimethylol
11/16/2005EP1594921A1 Photopolymerizable composition and photopolymerizable film prepared therefrom
11/16/2005EP1161463B1 Hydrophilic macromolecular compounds
11/16/2005CN1697856A Photopolymerizable composition and photopolymerizable film prepared therefrom
11/16/2005CN1227275C Alkali soluble latex thickeners
11/15/2005US6964991 Process for improving water-whitening resistance of pressure sensitive adhesives
11/15/2005US6964839 Using acid generator
11/10/2005WO2005105875A1 Photochromic compositions and articles comprising siloxane, alkylene or substituted alkylene oligomers
11/10/2005WO2005105874A1 Photochromic compositions and articles comprising polyether oligomer
11/10/2005WO2005105873A1 Resin for resist composition, negative resist composition and method for forming resist pattern
11/10/2005WO2005105871A1 Composition for optical disk-protecting film
11/10/2005WO2005105870A1 Compositions and methods for protecting materials from damage
11/10/2005WO2005105869A1 Copolymer for semiconductor lithography, method for producing same, and composition
11/10/2005US20050250924 Radiation transparent at exposure wavelength of activated lasers; dry etching resistance; photoresists sensitive to high energy radiation; mixture with photoacid generator and solvent
11/10/2005US20050250923 Derived linoleic acid, linolenic acid or a fatty acid mixture obtained from safflower oil; fracture resistance, lowering the processing viscosity and reducing the volatile organic compounds; high gloss surface finishes; air pollution control
11/10/2005US20050250921 formed by Michael-type addition of a reactive fluorinated polyether to a poly(meth)acryl compound; not prone to depletion over time
11/10/2005US20050250913 Acrylic rubber, crosslinkable acrylic rubber composition and moldings