Patents for C01G 35 - Compounds of tantalum (1,004)
11/2002
11/13/2002EP1255879A1 Method and composition for the prevention of high temperature corrosion due to alkali sulfates and alkali chlorides
10/2002
10/24/2002WO2002083568A1 Method for producing high purity potassium fluorotantalate crystal or high purity potassium fluoroniobate crystal and recrystallization vessel for use in the method for production, and potassium fluorotantalate crystal or high purity potassium fluoroniobate crystal produced by the method for production
10/10/2002WO2002079115A1 A microwave dielectric ceramic composition and a process for the preparation thereof
10/08/2002US6462934 Heat treating niobium oxide in the presence of a getter to transfer oxygen atoms from the niobium oxide to the getter material; capacitor anode comprising a niobium oxide having an atomic ratio of niobium to oxygen of 1: less than 2.5
10/03/2002US20020141936 Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides
09/2002
09/26/2002US20020135973 Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides
09/19/2002WO2002072154A1 Paramagnetic nanoparticle
09/19/2002US20020132388 Tantalum sputtering target and method of manufacture
09/04/2002EP1236224A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide
08/2002
08/21/2002EP1232226A1 Synthesis of nanoparticles
08/20/2002US6437440 Thin film metal barrier for electrical interconnections
08/14/2002CN1364313A Rapid ramping anneal method for fabricating superlattice materials
07/2002
07/24/2002EP1224699A1 Rapid ramping anneal method for fabricating superlattice materials
07/24/2002EP0649388B1 Method of making metal oxide clusters and metal oxide-polymer composites
07/10/2002CN1358326A Metal oxie thin films for high dielectric constant applications
07/09/2002US6417244 Metal oxide compositions and methods
07/09/2002US6416730 Reducing niobium pentoxide in the presence of hydrogen and homogenizing; for use in anodes
06/2002
06/25/2002US6410765 Methods of making functionalized nanoparticles
05/2002
05/30/2002WO2002043131A1 Tantalum oxide film, use thereof, and method and composition for forming the same
05/21/2002US6391275 Heat treatment in the presence of an oxygen scavenger; capacitor anodes with reduced direct current leakage and increased capacitance
05/14/2002US6387517 Inorganic polymer material with tantalic acid anhydride base, in particular with high refractive index, mechanically abrasionproof, method of manufacture, optical materials comprising such material
05/07/2002US6384534 Ceramic emissive mixture for cathode coatings prepared by mixing barium carbonate, tantalum oxide and at least calcium carbonate and tungsten oxide powders; sintering, milling and mixing with a binder to form a suspension;
05/07/2002US6383459 Method for purifying a tantalum compound using a fluoride compound and sulfuric acid
04/2002
04/30/2002US6379449 Process for the production of yellow to red pigments based on nitrides and oxidenitrides
04/25/2002WO2002032809A1 Oxide material, method for preparing oxide thin film and element using said material
04/25/2002US20020046874 Thin film metal barrier for electrical interconnections
04/17/2002CN1082935C Method for dissolution and purification of tantalum pentoxide
04/16/2002US6373685 Capacitor anode comprising a niobium oxide having an atomic ratio of niobium to oxygen of 1 to >2.5 and being formed at a formation voltage of about 6 volts or higher.
04/11/2002WO2002001622A3 Novel non-crystalline oxides for use in microelectronic, optical, and other applications
04/03/2002EP1192648A2 Metal oxide thin films for high dielectric constant applications
03/2002
03/28/2002US20020035961 Forming a ceramic film by crystallizing a raw material body which contains different types of raw material in mixed state, the different types of raw materials differ from one another in crystal growth condition and crystallization mechanism
03/27/2002EP1190988A2 Bismuth-containing laser markable compositions and methods of making and using same
03/20/2002CN1340631A Epuration method for tantalum
03/14/2002WO2002020696A1 Synthesis of nanoparticles
03/14/2002WO2002020695A1 Doped nanoparticles
03/14/2002DE10142692A1 Purification of tantalum compounds by combining with a fluoride-containing compound, other than hydrofluoric acid, and sulfuric acid to form a solution and then separating off the tantalum content
03/07/2002US20020028175 Methods to partially reduce certain metal oxides and oxygen reduced metal oxides
02/2002
02/28/2002US20020024108 Novel non-crystalline oxides for use in microelectronic, optical, and other applications
02/06/2002EP1177153A1 Bulk synthesis of long nanotubes of transition metal chalcogenides
01/2002
01/15/2002US6338832 Process for producing niobium and tantalum compounds
01/03/2002WO2002001622A2 Novel non-crystalline oxides for use in microelectronic, optical, and other applications
12/2001
12/27/2001WO2001098212A1 Ceramic film and method for its preparation, and semiconductor device and piezoelectric element
12/20/2001WO2001096242A1 Meso-porous transition metal oxide having crystallized pore wall and method for preparing the same
12/12/2001CN1326425A Method of producing inorganic compound solid substance and method of manufacturing semiconductor device
12/11/2001US6328947 Hydrolyzing metal halide in the presence of organic solvent to obtain fine particles of metal oxide
12/04/2001US6326315 Low temperature rapid ramping anneal method for fabricating layered superlattice materials and making electronic devices including same
11/2001
11/27/2001US6323055 Purifying k2taf7; reducing the purified ktaf7 to produce tantalum powder, refining the tantalum by reacting with iodine and finally electron beam melting the tantalum to form a high purity tantalum ingot.
11/27/2001US6322912 Electrolytic capacitor anode of valve metal oxide
11/20/2001US6319430 Preconditioned crystals of lithium niobate and lithium tantalate and method of preparing the same
11/15/2001US20010041374 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
11/15/2001US20010040785 Thin film deposition of mixed metal oxides
11/14/2001EP1153888A1 Method of producing inorganic compound solid substance and method of manufacturing semiconductor device
11/06/2001US6312565 Thin film deposition of mixed metal oxides
11/01/2001US20010036056 Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides
10/2001
10/31/2001CN1320104A Method to partially reduce certain metal oxide and oxygen reduced metal oxides
10/31/2001CN1320103A Methods to partially reduce niobium metal oxide and oxygen reduced niobium oxides
10/17/2001EP1146141A2 Liquid precursor mixtures for deposition of multicomponent metal containing materials
10/16/2001US6303391 Vaporizing bismuth .beta.-diketonate precursor to form a vaporized precursor, and contacting vapors with substrate to deposit bismuth or bismuth containing film
10/16/2001US6303231 Coating solutions for use in forming bismuth-based ferroelectric thin films, and ferroelectric memories formed with said coating solutions, as well as processes for production thereof
10/16/2001US6303091 When a raw material is calcined in hydrogen halide or chlorine gas, metal oxide containing less agglomerated particles and having a narrow particle size distribution and a uniform particle shape is obtained
10/10/2001EP1141171A1 Ternary oxide particles
09/2001
09/18/2001US6291885 Thin metal barrier for electrical interconnections
09/13/2001WO2001067516A1 Rapid ramping anneal method for fabricating superlattice materials
09/07/2001WO2000077832A3 Metal oxide thin films for high dielectric constant applications
09/05/2001EP1090153A4 Tantalum sputtering target and method of manufacture
08/2001
08/30/2001WO2001062669A1 New polyoxometalates and process for immobilization of technetium based thereon
08/02/2001US20010010867 Solution containing metal alkoxides and organometallic compounds obtainable by hydrolyzing composite metal alkoxides with water alone or with catalyst
07/2001
07/18/2001EP1115659A1 Methods to partially reduce certain metal oxides and oxygen reduced metal oxides
07/18/2001EP1115658A1 Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides
07/10/2001US6258974 Metal oxide compositions composites thereof and method
07/05/2001WO2001047813A1 Method for producing fluorinated potassium tantalate crystal and fluorinated potassium tantalate crystal
07/03/2001US6254991 Having a core-shell structure by dissolving a crystalline ceramic powder in water so as to leave a core portion of the ceramic powder while heating
07/03/2001CA2088781C Preparation of anhydrous niobium and tantalum pentafluorides
06/2001
06/26/2001US6251360 Method of producing bismuth layered compound
06/20/2001EP1108680A2 Electron emissive material for fluorescent lamp electrodes
06/20/2001EP0616723B1 Process for fabricating layered superlattice materials
06/12/2001US6245260 Mixed flux for yttrium tantalate x-ray phosphors
06/07/2001WO2001033619A8 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide
05/2001
05/30/2001EP0854841B1 Niobium and tantalum pentoxide compounds
05/29/2001US6238734 Liquid precursor mixtures for deposition of multicomponent metal containing materials
05/22/2001US6235103 Tantalum (V) nitride pigments, process for the production thereof and use thereof
05/10/2001WO2001033619A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide
05/10/2001WO2001033260A1 Preconditioned crystals of lithium niobate and lithium tantalate and methods of preparing the same
05/08/2001US6228702 Method of manufacturing semiconductor device
04/2001
04/11/2001EP1090153A1 Tantalum sputtering target and method of manufacture
03/2001
03/27/2001US6207082 Layer-structured oxide and process of producing the same
03/07/2001EP1081154A2 Materials and methods for growing complex perovskite oxide thin films
03/07/2001CN1286121A Mixed flux for X-ray yttrium tantalate fluorescent powder
03/07/2001CN1062885C Coloured pigments based on oxide-nitrides, preparation and use thereof
03/06/2001US6198119 Ferroelectric element and method of producing the same
03/06/2001US6197102 Small amount of separation (segregation, precipitation) of excessive metallic elements' particles, little leakage current, hydrogen heat treatment resistance as well as voltage resistance
02/2001
02/28/2001EP1078971A1 Mixed flux for yttrium tantalate x-ray phosphors
02/27/2001CA2314314A1 Mixed flux for yttrium tantalate x-ray phosphors
02/14/2001EP1037940A4 Block polymer processing for mesostructured inorganic oxide materials
01/2001
01/10/2001EP1067595A2 Liquid precursor mixtures for deposition of multicomponent metal containing materials
12/2000
12/21/2000WO2000077832A2 Metal oxide thin films for high dielectric constant applications
12/06/2000CN1059179C Metal niobates and/or tanlatates, their preparation and perovskites formed from them
11/2000
11/15/2000CN1058469C Vanadium dioxide microparticles, method for preparing same, and use for surface coating
11/09/2000WO2000066485A1 Bulk synthesis of long nanotubes of transition metal chalcogenides
11/02/2000EP0990059A4 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
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