Patents
Patents for B08B 3 - Cleaning by methods involving the use or presence of liquid or steam (36,920)
10/2005
10/05/2005CN1676230A Method for cleaning film
10/05/2005CN1676229A Row chain cleaning machine
10/05/2005CN1675995A Disinfectant and method of making
10/05/2005CN1222019C High-pressure treatment method
10/05/2005CN1221869C Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
10/05/2005CN1221331C Multi-functional cleaning module and cleaning apparatus using the module
10/05/2005CN1221330C Equipment for cleaning substrate
10/04/2005US6951710 Mixtures of amines and/or ammonium compounds, hydroxylamine, corrosion inhibitors, diluents and optionally water used for cleaning substrates
10/04/2005US6951221 Substrate processing apparatus
10/04/2005US6951042 Brush scrubbing-high frequency resonating wafer processing system and methods for making and implementing the same
10/02/2005CA2503753A1 Backsplash assembly and method
09/2005
09/29/2005WO2005089969A1 Device for removing blockages in drainpipes
09/29/2005WO2005089968A1 Conductive brush for cleaning metals
09/29/2005WO2005008202A3 A method and system to represent a temperature experienced by a medical washing machine
09/29/2005US20050215453 Composition comprising a mixture of alkylmono and polylactyllactate
09/29/2005US20050211703 Ceramic susceptor and a method of cleaning the same
09/29/2005US20050211281 Rinsing device for a sensor probe
09/29/2005US20050211280 Multifunction vehicular surface cleaning system
09/29/2005US20050211276 Lid for a semiconductor device processing apparatus and methods for using the same
09/29/2005US20050211275 electrolysis of water to generate hydrogen gas, used to dislodging said adhered matter from surfaces of electroconductive substrates, by force of said evolved hydrogen, then transferring the dislodged matter from the surface by flow of electrolytes via eductors
09/29/2005US20050211267 rinsing and drying substrates on a semiconductor wafer, comprising dispensing rinsing fluids onto the substrate during a rinsing cycle and spinning the wafer about an axis of rotation during a drying cycle to dry the wafer, while dispensing dry gases under pressure against the substrate
09/29/2005US20050210931 Balancing fluid storage and delivery system for a washing machine
09/29/2005DE102004063610A1 Color photoresist removing method for use during color filter fabrication, involves performing sequentially plasma ashing, wet etching, and plasma ashing processes on substrate to remove residue of color photoresist on substrate
09/29/2005DE102004011534A1 Preparation of foodstuffs before cooking, e.g. fruit and vegetable and meat or fish, uses a bath with ultrasonic waves before they are peeled or skinned as appropriate and then cooked with reduced cooking times
09/29/2005DE10118596B4 Vorrichtung und Verfahren zur Bearbeitung einer Wandfläche einer Ausnehmung Apparatus and method for processing a wall surface of a recess
09/28/2005EP1146970B1 High pressure cleaning device
09/28/2005CN1675401A Substrate processing apparatus and related systems and methods
09/28/2005CN1675028A Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and cryogenic cleaning techniques
09/28/2005CN1675006A Method for cleaning apparatus in which organic solvents containing (meth)acrylic acid have been treated and/or produced
09/28/2005CN1674232A Rinse nozzle and method
09/28/2005CN1672820A Apparatus for cleaning planar display panel
09/28/2005CN1672817A Washing method and washing apparatus
09/28/2005CN1672806A Regulating apparatus and regulating method for slit spray nozzle front end
09/28/2005CN1672774A Kitchen fume purifier
09/28/2005CN1221015C Wet machine platform with improved air mixer
09/28/2005CN1220558C Multi-component container assembly for washing super-purity solvent and washing method thereof
09/27/2005US6949465 Preparation process for semiconductor device
09/27/2005US6949146 Cutting chuck to separation modules; pulsation nozzle; ultrasonic generator
09/27/2005US6948505 provides a possibility of cleaning the burrs and brushes (files) of the remaining tooth material on them after operation on patient
09/27/2005US6948451 Apparatus and method for shampooing dogs, horses and other animals
09/27/2005CA2300716C Vehicle-washing system for washing of vehicles
09/27/2005CA2174335C Purification method
09/22/2005WO2005087396A1 Circulation type gas-dissolved water supply device and method of operating such device
09/22/2005WO2005087395A1 Cleaning assembly
09/22/2005WO2005087384A1 Device and method for cleaning a centrifugal separator
09/22/2005WO2005086577A2 Adapter for use in cleaning a whirlpool tub piping system, and method therefor
09/22/2005US20050208674 Using solution comprising hydrofluoric acid and/or aqueous hydrogen peroxide to remove copper, gold, silver and/or platinum from semiconductor wafers
09/22/2005US20050205699 Non-contact fluid particle cleaner and method
09/22/2005US20050205688 Pressure washer with improved mobility
09/22/2005US20050205417 Filling the sputtering chamber with argon, adjusting the radio frequency operating power, maintaining for 10 to 20 minutes, powering down and discharging the gas; complete removal of oxidative contaminants
09/22/2005US20050205120 Spinner bar
09/22/2005US20050205118 Sample Washer for Drilling Cuttings and other unconsolidated and discreet medias.
09/22/2005US20050205116 Underbody car wash for home-use
09/22/2005US20050205115 After a resist stripping solution of sulfuric acid and a hydrogen peroxide is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced to form a liquid film on the surface; paddling to maintain the liquid film
09/22/2005US20050205113 Processing solution supply nozzle is moved relatively from one end to the opposite end of a semiconductor wafer having undergone a developing operation while discharging an antistatic cleaning solution in a discharge width equal to or greater than the width of the wafer; defect prevention
09/22/2005US20050205109 Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device
09/22/2005US20050205108 Method and system for immersion lithography lens cleaning
09/22/2005US20050204937 Apparatus for peeling and scrubbing produce
09/22/2005DE19617206B4 Strömungsdämpfer für Spülstation Flow damper for cleaning station
09/22/2005DE102004010776A1 Washing installation for one or two person service has two washed goods containers and variable holding down device for different washed goods
09/22/2005DE102004009968A1 Nitrogen gas cleaning system for use in e.g. car washer, has evaporating unit to evaporate liquid nitrogen to produce pressurized nitrogen gas, where liquid nitrogen crystallizes at its cryogenic temperature to form granulates
09/22/2005CA2459895A1 23 rotor wash
09/21/2005EP1576689A2 Robotic paint/surface coating removal apparatus
09/21/2005EP1399343B1 Mobile cleaning or washing system for shopping trolleys
09/21/2005CN2726978Y Helical water conduit type scouring machine
09/21/2005CN2726745Y Multi-frequency ultrasonic cleaning device
09/21/2005CN2726744Y Bur-removing cleaner for notched belt pulley
09/21/2005CN1672245A Substrate processing device and substrate processing method
09/21/2005CN1669680A Nozzle cleaning device and substrate treating device
09/21/2005CN1669679A Suspension type strong water-air rubber plug cleaning machine
09/21/2005CN1669678A Oil and fat removing and cleaning method for precise, high degree of finish and super clean stainless steel tube
09/21/2005CN1669665A Thin seam nozzle and substrate treating device
09/21/2005CN1669656A Technological process for scrubbing weak magnetic particles
09/21/2005CN1219604C Ultrasonic cleaning method
09/21/2005CN1219603C Fluid driving stirrer for compressed gas cleaning system
09/20/2005US6946774 Segmented uniform energy megasonic transducer
09/20/2005US6946434 Non-toxic, non-hazardous, environmentally safe; provides an effective, fast acting cleaning solution for removal of tar, oils, asphalt and other bituminous materials from industrial equipment surfaces
09/20/2005US6946036 Method and device for removing particles on semiconductor wafers
09/20/2005US6946035 Dirt removed by irradiating the substrate with ultraviolet rays in an oxygen-containing atmosphere in advance of wet cleaning with pure water; wet cleaning time and the amount of pure water can be reduced; liquid crystal device glass substrates
09/20/2005US6945853 Methods for cleaning utilizing multi-stage filtered carbon dioxide
09/20/2005US6945262 Analysis equipment for determining physical properties of an organic solution
09/20/2005US6945261 Apparatuses, systems and processes for surface cleaning
09/20/2005US6945260 Machine for treating objects
09/20/2005US6945259 Substrate cleaning method and substrate cleaning apparatus
09/20/2005US6945007 Method of patterning, installing, renewing and/or recycling carpet tiles
09/20/2005CA2135869C Method and apparatus for shot blasting materials
09/15/2005WO2005086214A1 Two-fluid nozzle for cleaning substrate and substrate cleaning device
09/15/2005WO2005086208A1 Apparatus and method for drying substrates
09/15/2005WO2005085563A1 Washing arrangement for a column with a circular cross section, preferably a flagpole
09/15/2005WO2005084831A1 Method of removing alkali-soluble photosensitive resin
09/15/2005WO2005084829A1 Method and device for conditioning of an object
09/15/2005WO2005084828A1 Surface cleaning head
09/15/2005WO2005084302A2 Pressure washer with diagnostic indicators
09/15/2005WO2005084241A2 Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
09/15/2005WO2005068681A3 Cleaning tantalum-containing deposits from process chamber components
09/15/2005WO2005032725A3 High pressure tube cleaning apparatus
09/15/2005WO2005006396A3 Megasonic cleaning using supersaturated cleaning solution
09/15/2005WO2004091283A3 Fluid control system for air/liquid
09/15/2005US20050202230 High purity sealing material
09/15/2005US20050201747 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system